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SZSE:002741
Circuit Formation
Information
Application:

It is used for the removal of inner dry film, outer dry film and ENIG selective dry film during PCB manufacturing, and in particular applicable to the removal of dry film for fine circuit, and applies to the film removal for IC substrate and MSAP process. 。

Advantage introduction:

Free of caustic soda, free of impact on tin surface and solder mask ink;
Free of oxidation on copper surface and gold surface;
Film broken into small particles to prevent wrapping roller and blocking nozzle;
High film removal rate, more than 1x faster than NaOH;
Bath life can be extended more than 10X than NaOH;
Applicable to film removal for IC substrate and MSAP process.
 
 

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Copyright ? Guangdong?Guanghua?Sci-Tech?Co.,?Ltd. GuangDong ICP No. 14033791-1
国产精品国产片在线观看蜜臀日韩一区二区在线_国模精品一区二区三区_国产2345在线亚洲精品_久久99国产精品二区不卡_欧美vs日韩vs国产在线观看_久久精品成人亚洲综合日韩